JPS-9030 Photoelectron Spectrometer

Description

The JPS-9030 is an X-ray photoelectron spectrometer for surface analysis. It features a multi-channel plate detector and operates under an ultra-high vacuum, with a maximum pressure specification of 7×10⁻⁸ Pa or lower. The system is equipped with a Kaufman-type etching ion source mounted on a separate specimen exchange chamber; this source provides adjustable etching rates from 1 to 100 nm/min (SiO₂ equivalent) for depth profiling applications. Analytical methods include the constant analyzer energy and constant retarding ratio modes. The instrument supports Angle-Resolved XPS (ARXPS) and Total Reflection XPS (TRXPS) techniques, which are used for high-sensitivity analysis of surface layers, reportedly down to approximately 1 nm under optimized conditions. Software (SpecSurf Ver. 2.0) includes an automatic qualitative analysis function for processing data from multiple acquisition points. Optional accessories include a monochromatic X-ray source, an argon gas cluster ion source for organic samples, an infra-red heating system capable of exceeding 1000°C, and a transfer vessel for atmospheric protection of specimens.