JBX-A9 Electron Beam Lithography System

Description

The JBX-A9 is an electron beam lithography system from JEOL designed for high-precision direct writing on large substrates. It features a maximum scanning speed of 200 MHz and a standard accelerating voltage of 100 kV. The system can handle large sample formats, including 300 mm wafers and 9-inch masks. It offers a sensitivity specification of 1000 µm. The design incorporates JEOL's electron optics for stability and is built with throughput and precision as key objectives. Options include a FOUP (Front-Opening Unified Pod) system for automated handling and in-line connectivity to other process tools like coaters and developers. The system also emphasizes lower power consumption and user-friendly operation for personnel with varying levels of experience.