FIB SEM Focused Ion Beam MicroscopeMicroscopy and Laboratory Microscopes
JBX-3050 Focused Ion Beam Microscope
Manufacturer: JEOL USA, Inc.
SKU: JBX-3050
Description
The JBX-3050 from JEOL USA, Inc. is a focused ion beam microscope configured for electron beam lithography applications, specifically in mask and reticle fabrication. The system is engineered to meet design rules for 45 to 32 nm processes. It employs a variable shaped beam and a vector scan exposure method to write patterns with high positional accuracy, specified at ≤ ±10 nm. The accelerating voltage is 50 kV. Design priorities for this system include high-speed patterning, reliable operation, and precise writing fidelity, leveraging JEOL's extensive experience in electron beam technology.
Specifications
| Item | JBX-3050 Focused Ion Beam Microscope |
| Company | JEOL USA, Inc. |
| Catalog Number | JBX-3050 |
| Quantity | EA |
| Voltage | 50 kV |
| Sensitivity | Writing Position Accuracy: ≤ ± 10 nm |
| Method | Exposure Method: Vector scan, Variable shaped beam |